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International Journal of Electrochemistry
Volume 2017, Article ID 4289517, 13 pages
https://doi.org/10.1155/2017/4289517
Research Article

Online Monitoring of Copper Damascene Electroplating Bath by Voltammetry: Selection of Variables for Multiblock and Hierarchical Chemometric Analysis of Voltammetric Data

Technic Inc., 47 Molter St., Cranston, RI 02910, USA

Correspondence should be addressed to Aleksander Jaworski; moc.cinhcet@iksrowaja

Received 5 August 2017; Accepted 19 November 2017; Published 14 December 2017

Academic Editor: Gerd-Uwe Flechsig

Copyright © 2017 Aleksander Jaworski et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

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