Indian Journal of Materials Science / 2013 / Article / Fig 3

Research Article

Preparation and Characterization of R.F. Magnetron Sputtered Mo:ZnO Thin Films

Figure 3

The variation of compressive stress in the Mo:ZnO films deposited at a sputtering pressure of 1 × 10−2 mbar and at substrate temperatures of 473 K and 673 K.
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