Indian Journal of Materials Science / 2013 / Article / Tab 2

Research Article

Preparation and Characterization of R.F. Magnetron Sputtered Mo:ZnO Thin Films

Table 2

Energy gap data of Mo:ZnO films.

Atomic percent of Mo in ZnOSputtering pressure = 1 × 10−2 mbar,
= 473 K = 673 K
1st transition2nd transition1st transition2nd transition
Energy gap ( ) (eV) Energy gap ( ) (eV)

Mo(0%):ZnO2.483.023.15
Mo(1%):ZnO3.053.063.26
Mo(1.5%):ZnO2.663.173.43
Mo(2 %):ZnO3.343.56