Preparation and Characterization of R.F. Magnetron Sputtered Mo:ZnO Thin Films

Table 2

Energy gap data of Mo:ZnO films.

Atomic percent of Mo in ZnO	Sputtering pressure = 1 × 10^−2 mbar,
	𝑇𝑠 = 473 K		𝑇𝑠 = 673 K
	1st transition	2nd transition	1st transition	2nd transition
	Energy gap (𝐸𝑔) (eV)		Energy gap (𝐸𝑔) (eV)
Mo(0%):ZnO	2.48	3.02	—	3.15
Mo(1%):ZnO	—	3.05	3.06	3.26
Mo(1.5%):ZnO	2.66	3.17	—	3.43
Mo(2 %):ZnO	—	3.34	—	3.56