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International Journal of Optics
Volume 2012 (2012), Article ID 238367, 7 pages
Research Article

Polishing Sapphire Substrates by 355 nm Ultraviolet Laser

School of Electromechanical Engineering, Guangdong University of Technology, Guangzhou 510090, China

Received 15 February 2012; Revised 21 May 2012; Accepted 29 May 2012

Academic Editor: Jian Xu

Copyright © 2012 X. Wei et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

X. Wei, X. Z. Xie, W. Hu, and J. F. Huang, “Polishing Sapphire Substrates by 355 nm Ultraviolet Laser,” International Journal of Optics, vol. 2012, Article ID 238367, 7 pages, 2012. doi:10.1155/2012/238367