Gap Nanoantennas toward Molecular Plasmonic Devices

Figure 12

Schematic outline of the fabrication procedure of a molecular plasmonic nanoantenna involving the consecutive application of electron-beam lithography, focused ion beam (FIB) milling, and localized chemical surface functionalization. The inset (a) displays the surface grafting of a Rhodamine B (RhB) fluorophore onto the ITO substrate. The FIB step (step 5) is represented by the SEM images in (b) and (c) where the gap is milled either through a few nanometers of chromium only (top row in (c)) or all the way to the ITO layer (bottom row in (c)).