Photocatalytic TiO2 films on glass and quartz plates were obtained by the chemical vapour
deposition using Ti(dpm)2(Opri)2 complex compound (CC-CVD method) in a standard vacuum apparatus
at 1.2–2.0 × 10-4 mbar. The substrate temperature was stabilised in the range of 450–600 ∘C. The growth rate varied from several nanometres to several dozen of nanometres per minute. Structural information on
TiO2 thin films was obtained from synchrotron radiation experiments. High-resolution grazing incidence
X-ray diffraction (GIXRD) experiments were performed at the high-resolution powder diffractometer at the
DESY/HASYLAB beamline B2 (Hamburg, Germany). Thin films deposited on either single-crystal Si wafers
or on amorphous quartz substrates were analysed. The photocatalytic activity of the TiO2 thin films was
studied using a photocatalytic reactor. The fungicide Fenarimol was chosen as chemical indicator and its
degradation kinetics was followed by High-Performance Liquid Chromatography (HPLC).
