Studying the Properties of RF-Sputtered Nanocrystalline Tin-Doped Indium Oxide

Table 1

Resistivity, thickness and refractive index of ITO thin films deposited using various RF power for 40 min deposition time.

RF power; (W)	Thickness; (μm)	Refractive; index	Resistivity; (Ω·cm)
50	0.50	1.48	77.15×10^−4
100	0.59	1.49	9.98×10^−4
150	0.63	1.5	3.96×10^−4
200	1.09	1.506	1.62×10^−4
250	1.17	1.505	2.32×10^−4
300	1.29	1.509	2.38×10^−4