Studying the Properties of RF-Sputtered Nanocrystalline Tin-Doped Indium Oxide

Table 2

Resistivity, thickness and refractive index of ITO thin films deposited using RF deposition power value of 200 W for various deposition times.

Deposition time; (min)	Thickness; (μm)	Refractive; index	Resistivity; (Ω·cm)
10	0.46	1.499	5.18×10^−4
20	0.52	1.501	4.1×10^−4
30	0.63	1.503	1.92×10^−4
40	1.09	1.506	1.62×10^−4