Numerical Simulation of the Effect of Heater Position on the Oxygen Concentration in the CZ Silicon Crystal Growth Process
Figure 4
Distribution of temperature, streamtrace, and oxygen concentration in the melt for mm in a conventional CZ furnace ( mm): (a) isothermal lines (left) and streamtraces (right); (b) oxygen concentration isolines (left) and stream traces (right). The units of temperature, velocity vector, and oxygen concentration are K, m/s, and ppma, respectively. The spacing of the isothermal lines and concentration isolines are 3 K and 1 ppma, respectively.
