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International Journal of Photoenergy
Volume 2012 (2012), Article ID 401393, 6 pages
http://dx.doi.org/10.1155/2012/401393
Research Article

Alumina and Hafnia ALD Layers for a Niobium-Doped Titanium Oxide Photoanode

1Department of Materials Science and Engineering, University of Washington, Seattle, WA 98195, USA
2Physics Department, Al-Azhar University-Gaza, P.O. Box 1277, Gaza, Palestine

Received 13 November 2012; Accepted 18 December 2012

Academic Editor: Sudhakar Shet

Copyright © 2012 Naji Al Dahoudi et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

Naji Al Dahoudi, Qifeng Zhang, and Guozhong Cao, “Alumina and Hafnia ALD Layers for a Niobium-Doped Titanium Oxide Photoanode,” International Journal of Photoenergy, vol. 2012, Article ID 401393, 6 pages, 2012. doi:10.1155/2012/401393