Amorphous Silicon Single-Junction Thin-Film Solar Cell Exceeding 10% Efficiency by Design Optimization

Table 3

a-Si:H films deposition parameters.

Layer	Material	PECVD		Flow rate (sccm)				Pressure (Pa)	Power density; (mW/cm^2)	Sub. temp. (°C)	Thickness (nm)
			SiH4	MMS	H2	B2H6	PH3
p	a-SiC:H	RF	6	4	140	10	—	70	130	200	18
Buffer	a-SiC:H	RF	6	4	140	—	—	70	130	200	2
i	a-Si:H	VHF	5	—	45	—	—	50	130	200	500
n	a-Si:H	RF	5	—	—	—	2.5	50	80	200	20

MMS: monomethylsilane.
B₂H₆ and PH₃ : 1% H₂ diluted.