Doped Titanium Dioxide Films Prepared by Pulsed Laser Deposition Method

<table>Decomposition rate with time of MO using N-doped TiO<sub>2</sub> films prepared at different temperature under visible light irradiation, (a) without TiO<sub>2</sub>, (b) RT, (c) 200°C, (d) 400°C. <svg height="15.6875" id="M7" style="vertical-align:-3.39066pt" version="1.1" viewbox="0 0 18.4375 15.6875" width="18.4375" xmlns="http://www.w3.org/2000/svg" xmlns:xlink="http://www.w3.org/1999/xlink">
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t-52 18.5v23q79 14 139 41v-81q3 2 29 20.5t44 29.5q45 28 81 28t66 -22t46 -61q25 20 83 57q39 26 76 26q59 0 93 -40t34 -113v-193q0 -49 10.5 -60.5t54.5 -16.5v-26z" id="x6D"></path></g><g transform="matrix(.017,-0,0,-.017,13.848,12.013)"><path d="M463 437l5 -8q-21 -38 -45 -51l-57 3q30 -35 30 -88q0 -76 -52.5 -118t-122.5 -42q-24 0 -51 5q-30 -21 -30 -42q0 -16 16 -27t47 -11q19 0 54 0.5t52 0.5q36 0 65.5 -8t53.5 -36t24 -74q0 -77 -75 -137.5t-174 -60.5q-79 0 -126 37.5t-48 84.5q0 32 24 56q21 21 83 70
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</svg>, and <i>C</i> is the concentration changing with time.</table>

International Journal of Photoenergy

fig5

Figure 5

Figure 5: Doped Titanium Dioxide Films Prepared by Pulsed Laser Deposition Method 