A Reuse Evaluation for Solar-Cell Silicon Wafers via Shift Revolution and Tool Rotation Using Magnetic Assistance in Ultrasonic Electrochemical Micromachining
Figure 9
Amount of Si3N4 layer and epoxy film removed at different feed rates of workpiece using different diameters () of cathode and different sizes of gap between the anode and cathode (phosphoric acid 25% wt, NaNO3 15% wt, PO4-3-P 5% wt, 60°C, 40 L/min, continuous DC, 150 A, 100 kHZ/150 W, 4000 Gauss, shift 800 rpm, and tool 900 rpm).
