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International Journal of Photoenergy
Volume 2013, Article ID 650281, 8 pages
Research Article

Fouling Removal of UF Membrane with Coated TiO2 Nanoparticles under UV Irradiation for Effluent Recovery during TFT-LCD Manufacturing

Department of Safety, Health and Environmental Engineering, National United University, 1 Lienda, Miaoli 36003, Taiwan

Received 1 January 2013; Revised 3 April 2013; Accepted 3 April 2013

Academic Editor: Vincenzo Augugliaro

Copyright © 2013 S. H. You and C. T. Wu. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.


An ultrafiltration (UF) membrane process was employed to treat the secondary effluent discharged from a manufacturing of thin film transistor-liquid crystal display (TFT-LCD) in this study. A bench-scale system was performed to evaluate the fouling removal of a UF membrane with coated titanium dioxide (TiO2) nanoparticles under UV irradiation. The operating pressure and feed temperature were controlled at 300 KN/m2 and 25°C, respectively. It was found that the optimum operating conditions were attained with TiO2 concentrations of 10 wt% for both 5 KD and 10 KD MWCO. Continuous UV irradiation of 5 KD MWCO improved the permeate flux rate from 45.0% to 59.5% after 4 hours of operation. SEM-EDS analysis also showed that the photocatalytic effect had reduced the average thickness of cake fouling on the membrane from 6.40 μm to 2.70 μm for 5 KD MWCO and from 6.70 μm to 3.1 μm for 10 KD MWCO. In addition, the membrane contact angle was reduced from 54° to 44°. The photocatalytic properties of TiO2 apparently increased the hydrophilicity of the membrane surface, thereby reducing membrane fouling.