International Journal of Photoenergy / 2013 / Article / Tab 1

Research Article

RF Magnetron Sputtering Aluminum Oxide Film for Surface Passivation on Crystalline Silicon Wafers

Table 1

The deposition rate of different sputtering powers measured by n&k Analyzer 1200.

Power (W)Deposition rate (nm/min)

6004.862
8006.893
10008.997
120011.256
140012.678
160014.288

Article of the Year Award: Outstanding research contributions of 2020, as selected by our Chief Editors. Read the winning articles.