RF Magnetron Sputtering Aluminum Oxide Film for Surface Passivation on Crystalline Silicon Wafers

Table 1

The deposition rate of different sputtering powers measured by n&k Analyzer 1200.

Power (W)	Deposition rate (nm/min)
600	4.862
800	6.893
1000	8.997
1200	11.256
1400	12.678
1600	14.288