Expanding Thermal Plasma Chemical Vapour Deposition of ZnO:Al Layers for CIGS Solar Cells

Table 1

The experimental parameters used to deposit ZnO:Al layers at low thermal budget (LTB) and high thermal budget (HTB) conditions.

Condition	ΦDEZ (g/h)	ΦTMA (g/h)	ΦAr (slm)	ΦO2 (slm)	𝑝 (mbar)	Temp.; set-point (°C)	He flow	Time; (min)	Final temp. 𝑇𝑓 (°C)
LTB	4.5	0.6	1.5	100	2	100	On	3.3–13.3	140–290
HTB	4.5	0.6	1	100	2	100	Off	6.0–30.4	158–392