Research Article
Improved Performance for Dye-Sensitized Solar Cells Using a Compact TiO2 Layer Grown by Sputtering
Table 1
The deposition conditions for TiO2.
| Substrate | nonalkali glass mm3 | Target | Ti (99.99% purity) | Gas | Ar, O2, N2 (99.99% purity) | Base pressure | torr | Spin speed of the substrate | 10 rpm | Substrate-to-target distance | 80 mm | rf power | 100 W | Sputtering pressure | 10 mtorr | Substrate temperature | 300°C |
| Sample | Ar flow rate (mL/min) | O2 flow rate (mL/min) | N2 flow rate (mL/min) | Ar : O2 : N2 |
| Number 1 | 35 | 35 | 0 | 1 : 1 : 0 | Number 2 | 48 | 24 | 0 | 2 : 1 : 0 | Number 3 | 54 | 18 | 0 | 3 : 1 : 0 | Number 4 | 20 | 20 | 20 | 1 : 1 : 1 | Number 5 | 29 | 29 | 14 | 1 : 1 : 0.5 | Number 6 | 25 | 25 | 8 | 1 : 1 : 0.33 | Number 7 | 27 | 14 | 14 | 2 : 1 : 1 | Number 8 | 36 | 18 | 9 | 2 : 1 : 0.5 | Number 9 | 36 | 18 | 6 | 2 : 1 : 0.33 | Number 10 | 45 | 14 | 14 | 3 : 1 : 1 | Number 11 | 45 | 15 | 7 | 3 : 1 : 0.5 | Number 12 | 41 | 14 | 4 | 3 : 1 : 0.33 |
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