Research Article

Improved Performance for Dye-Sensitized Solar Cells Using a Compact TiO2 Layer Grown by Sputtering

Table 1

The deposition conditions for TiO2.

Substratenonalkali glass  mm3
TargetTi (99.99% purity)
GasAr, O2, N2 (99.99% purity)
Base pressure  torr
Spin speed of the substrate10 rpm
Substrate-to-target distance80 mm
rf power100 W
Sputtering pressure 10 mtorr
Substrate temperature300°C

SampleAr flow rate (mL/min)O2 flow rate (mL/min)N2 flow rate (mL/min)Ar : O2 : N2

Number 1353501 : 1 : 0
Number 2482402 : 1 : 0
Number 3541803 : 1 : 0
Number 42020201 : 1 : 1
Number 52929141 : 1 : 0.5
Number 6252581 : 1 : 0.33
Number 72714142 : 1 : 1
Number 8361892 : 1 : 0.5
Number 9361862 : 1 : 0.33
Number 104514143 : 1 : 1
Number 11451573 : 1 : 0.5
Number 12411443 : 1 : 0.33