Research Article
Nanopatterned Silicon Substrate Use in Heterojunction Thin Film Solar Cells Made by Magnetron Sputtering
Table 1
I-V characteristics of four NPSiS HJT cells and nontextured reference HJT cell.
| | | Reflectance at 500 nm (%) | Designated areas (cm2) | (mV) | (mA/cm2) | FF (%) | Eff (%) | Enhancement (%) | Rs (-cm2) |
| | Nontextured | 35.91 | 0.76 | 537.69 | 28.80 | 56.30 | 8.67 | — | 9.61 | | NPSiS-1 | 27.33 | 0.68 | 461.84 | 31.42 | 68.90 | 9.99 | 15.22 | 3.08 | | NPSiS-2 | 23.38 | 0.76 | 434.89 | 32.26 | 65.00 | 9.12 | 5.19 | 3.07 | | NPSiS-3 | 12.99 | 0.79 | 442.96 | 33.70 | 66.50 | 9.93 | 14.53 | 2.54 | | NPSiS-4 | 2.64 | 0.71 | 481.94 | 36.20 | 65.20 | 11.40 | 31.49 | 2.68 |
|
|
