Effect of Different Deposition Power of In₂O₃ Target on the Characteristics of IGZO Thin Films Using the Cosputtering Method

Figure 2

Surface morphology of IGZO thin films as a function of deposition power of In₂O₃ target. (a) 70 W, (b) 80 W, (c) 90 W, and (d) 100 W, respectively.

(a)

(b)

(c)

(d)