The Photocatalytic Activity and Compact Layer Characteristics of TiO₂ Films Prepared Using Radio Frequency Magnetron Sputtering

Table 5

The confirmation test results for the multiple performance characteristics, using the initial and the optimal process parameters.

Level	Initial process parameters	Optimal process; parameters	Improvement rate (%)
	𝐴3𝐵3𝐶2𝐷1	𝐴3𝐵3𝐶2𝐷3
Deposition rate (Å/min)	4.775	5.48	12.87
Contact angle (degree)	63.09	53.47	15.25
MB absorbance	1.0305	0.865	16.06