Superior Antireflection Coating for a Silicon Cell with a Micronanohybrid Structure

Table 3

Average reflectivity of the two-stage MAE fabricated micronanohybrid structures subjected to a first-stage processing time of 30 sec for the light spectrum of 200–1000 nm.

Second-stage etching time (min)	Average reflectance (%)
	200–400 nm	401–800 nm	801–1000 nm	200–1000 nm
1	4.26	5.49	8.16	5.85
2	5.26	3.45	4.41	4.16
3	3.16	3.34	3.51	3.54
4	1.96	2.19	2.57	2.32
5	0.74	1.12	1.97	1.21