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International Journal of Photoenergy
Volume 2014, Article ID 872849, 5 pages
Research Article

Effect of the CO2/SiH4 Ratio in the p-μc-SiO:H Emitter Layer on the Performance of Crystalline Silicon Heterojunction Solar Cells

1Solar Energy Technology Laboratory, National Electronics and Computer Technology Center, 112 Thailand Science Park, Phahonyothin Road, Klong 1, Klong Luang, Pathumthani 12120, Thailand
2PTT Research & Technology Institute, PTT Public Company Limited, 70 Moo2 Phahonyothin Road, Sanubtup, Wangnoi, Ayutthaya 13170, Thailand

Received 27 November 2013; Revised 3 June 2014; Accepted 4 June 2014; Published 22 June 2014

Academic Editor: Mahmoud M. El-Nahass

Copyright © 2014 Jaran Sritharathikhun et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

Citations to this Article [3 citations]

The following is the list of published articles that have cited the current article.

  • Alexei Richter, Lei Zhao, Friedhelm Finger, and Kaining Ding, “Nano-composite microstructure model for the classification of hydrogenated nanocrystalline silicon oxide thin-films,” Surface and Coatings Technology, 2015. View at Publisher · View at Google Scholar
  • Yu-Hung Chen, Yung-Tsung Liu, Chien-Fu Huang, Jun-Chin Liu, and Chen-Cheng Lin, “Improved photovoltaic properties of amorphous silicon thin-film solar cells with an un-doped silicon oxide layer,” Materials Science in Semiconductor Processing, vol. 31, pp. 184–188, 2015. View at Publisher · View at Google Scholar
  • Lertvanithphol, Nuntawong, Chananonnawathorn, Klamchuen, Horprathum, Eiamchai, Inthisang, Krajangsang, Limwichean, Patthanasettakul, Wutikhun, Chindaudom, Rakreungdet, Sritharathikhun, and Sriprapha, “Spectroscopic ellipsometry investigation of microcrystalline fractions in p-type hydrogenated microcrystalline silicon oxide (p-μc-SiOx:H) ultra-thin films,” Materials Science in Semiconductor Processing, vol. 68, pp. 327–333, 2017. View at Publisher · View at Google Scholar