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International Journal of Photoenergy
Volume 2014, Article ID 956083, 6 pages
http://dx.doi.org/10.1155/2014/956083
Research Article

The Structure and Stability of Molybdenum Ditelluride Thin Films

College of Materials Science and Engineering, Sichuan University, Chengdu 610064, China

Received 20 February 2014; Revised 23 May 2014; Accepted 26 May 2014; Published 10 July 2014

Academic Editor: Sudhakar Shet

Copyright © 2014 Zhouling Wang et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

Abstract

Molybdenum-tellurium alloy thin films were fabricated by electron beam evaporation and the films were annealed in different conditions in N2 ambient. The hexagonal molybdenum ditelluride thin films with well crystallization annealed at 470°C or higher were obtained by solid state reactions. Thermal stability measurements indicate the formation of MoTe2 took place at about 350°C, and a subtle weight-loss was in the range between 30°C and 500°C. The evolution of the chemistry for Mo-Te thin films was performed to investigate the growth of the MoTe2 thin films free of any secondary phase. And the effect of other postdeposition treatments on the film characteristics was also investigated.