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International Journal of Photoenergy
Volume 2015, Article ID 790242, 7 pages
http://dx.doi.org/10.1155/2015/790242
Research Article

Influence of Substrate on Crystal Orientation of Large-Grained Si Thin Films Formed by Metal-Induced Crystallization

1Institute of Applied Physics, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan
2The Wakasa Wan Energy Research Center, Tsuruga, Fukui 914-0192, Japan
3Materials, Physics and Energy Engineering, Nagoya University, Aichi 464-8603, Japan
4Japan Science and Technology Agency, CREST, 5 Sanbancho, Chiyoda-ku, Tokyo 102-0075, Japan

Received 17 July 2014; Revised 18 December 2014; Accepted 8 January 2015

Academic Editor: Serap Gunes

Copyright © 2015 Kaoru Toko et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

Kaoru Toko, Mitsuki Nakata, Atsushi Okada, Masato Sasase, Noritaka Usami, and Takashi Suemasu, “Influence of Substrate on Crystal Orientation of Large-Grained Si Thin Films Formed by Metal-Induced Crystallization,” International Journal of Photoenergy, vol. 2015, Article ID 790242, 7 pages, 2015. https://doi.org/10.1155/2015/790242.