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International Journal of Photoenergy
Volume 2016 (2016), Article ID 8183673, 8 pages
Research Article

Investigation of Boron Thermal Diffusion from Atmospheric Pressure Chemical Vapor Deposited Boron Silicate Glass for N-Type Solar Cell Process Application

1D&S Inc., Tokyo 193-0834, Japan
2AMAYA Co., Ltd., Saitama 343-0822, Japan

Received 9 April 2016; Accepted 7 June 2016

Academic Editor: Prakash Basnyat

Copyright © 2016 Ikuo Kurachi and Kentaro Yoshioka. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.


An atmospheric pressure chemical vapor deposition (AP-CVD) system has been newly developed for boron silicate glass (BSG) film deposition dedicating to solar cell manufacturing. Using the system, thermal boron diffusion from the BSG film is investigated and confirmed in terms of process stability for surface property before BSG deposition and BSG thickness. No degradation in carrier lifetime is also confirmed. A boron diffusion simulator has been newly developed and demonstrated for optimization of this process. Then, the boron thermal diffusion from AP-CVD BSG is considered to be the suitable method for N-type silicon solar cell manufacturing.