Research Article

Nanostructured Dielectric Layer for Ultrathin Crystalline Silicon Solar Cells

Figure 3

Fabrication process of the SiNx NDL. (a) Deposit the SiNx layer on the c-Si, with a thin layer of SiOx (~10 nm) on top using PECVD; (b) assemble a monolayer of silica nanospheres on top using LB coating method; (c) dry etch the SiNx with the silica nanospheres as etching masks; and (d) remove the remaining silica nanospheres and SiOx using wet etch.
(a)
(b)
(c)
(d)