Research Article
Nanostructured Dielectric Layer for Ultrathin Crystalline Silicon Solar Cells
Figure 3
Fabrication process of the SiNx NDL. (a) Deposit the SiNx layer on the c-Si, with a thin layer of SiOx (~10 nm) on top using PECVD; (b) assemble a monolayer of silica nanospheres on top using LB coating method; (c) dry etch the SiNx with the silica nanospheres as etching masks; and (d) remove the remaining silica nanospheres and SiOx using wet etch.
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