H₂O/O₂ Vapor Annealing Effect on Spin Coating Alumina Thin Films for Passivation of Silicon Solar Cells

Table 1

The ratio of each bonding peak for each annealing condition.

Time	Annealing condition	Al-O area (%)	Al-OH area (%)
15 min	H2O/O2	92.71	7.29
	O2	91.95	8.05
	Air	95.50	4.50
120 min	H2O/O2	92.08	7.92
	O2	93.25	6.75
	Air	88.44	11.56