Atomic Layer Deposition of TiO<sub>2</sub> Nanocoatings on ZnO Nanowires for Improved Photocatalytic Stability

<div>Process flow for ALD TiO<sub>2</sub>. TDMAT is adsorbed onto a substrate and the excess purged by argon. Next, H<sub>2</sub>O enters the chamber and reacts with TDMAT in a self-limiting reaction; the excess H<sub>2</sub>O and by-products are purged by argon.</div>

International Journal of Photoenergy

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Figure 3

Figure 3: Atomic Layer Deposition of TiO<sub>2</sub> Nanocoatings on ZnO Nanowires for Improved Photocatalytic Stability 

International Journal of Photoenergy

Atomic Layer Deposition of TiO2 Nanocoatings on ZnO Nanowires for Improved Photocatalytic Stability

Figure 3

Atomic Layer Deposition of TiO₂ Nanocoatings on ZnO Nanowires for Improved Photocatalytic Stability