Research Article
Role of Interfacial Oxide Layer in MoOx/n-Si Heterojunction Solar Cells
Figure 1
(a) Schematic of the MSHJ solar cell structure. (b) The cross-sectional HRTEM image of the interfacial layer of the MoOx/-Si. (c) Relative atomic percentage distribution of O (Si) (denotes O-Si bond), O (Mo) (denotes O-Mo bond), and Si with an increasing etching time for the transitional region between the MoOx film and the -Si substrate.
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