Development of an Environmentally Friendly Resist-Removal Process Using Wet Ozone

Table 4

Percentages of ion-implanted resist damaged layer by SEM and stripping of ion-implanted resist using chemicals.

Sample	Resist removal (wet ozone) damaged layer/total	SEM observation damaged layer/total	Resist removal (chemicals) damaged layer/total
10 keV (B ions)	0.04	0.09	0.08
70 keV (B ions)	0.25	0.60	0.50
150 keV (B ions)	—	0.72	0.60
10 keV (P ions)	0.03	—	0.03
70 keV (P ions)	—	0.34	0.25
150 keV (P ions)	—	0.46	0.36