International Journal of Polymer Science / 2017 / Article / Fig 3

Research Article

Photoresist Removal Using H Radicals Generated by Iridium Hot-Wire Catalyst

Figure 3

The removal rate as a function of the additional baking temperature when the surface temperatures were 250, 280, and 300°C, respectively.

We are committed to sharing findings related to COVID-19 as quickly and safely as possible. Any author submitting a COVID-19 paper should notify us at to ensure their research is fast-tracked and made available on a preprint server as soon as possible. We will be providing unlimited waivers of publication charges for accepted articles related to COVID-19. Sign up here as a reviewer to help fast-track new submissions.