Characterization of Defects and Stress in Polycrystalline Silicon Thin Films on Glass Substrates by Raman Microscopy

Figure 3

SEM images of ELC poly-Si (a) before and (b) after Secco etching for 40 s and (c) plan view TEM image of a typical grain.

(a) 0 s

(b) 40 s

(c)