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International Journal of Spectroscopy
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Special Issues
International Journal of Spectroscopy
/
2011
/
Article
/
Fig 4
/
Research Article
Characterization of Defects and Stress in Polycrystalline Silicon Thin Films on Glass Substrates by Raman Microscopy
Figure 4
An AFM image of the ELC poly-Si surface after light Secco etching. The viewing area is
μ
m
2
.