Table of Contents
ISRN Nanotechnology
Volume 2012, Article ID 275872, 5 pages
Research Article

Spray Pyrolysis Deposition of Nanostructured Tin Oxide Thin Films

1Materials Research Laboratory, K.T.H.M. College, Nashik 422 005, India
2Materials Research Laboratory, Arts, Commerce and Science College, Nandgaon 423 106, India

Received 17 April 2012; Accepted 25 June 2012

Academic Editors: K. Ray and L. Xu

Copyright © 2012 G. E. Patil et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.


Nanostructured SnO2 thin films were grown by the chemical spray pyrolysis (CSP) method. Homemade spray pyrolysis technique is employed to prepare thin films. SnO2 is wide bandgap semiconductor material whose film is deposited on glass substrate using aqueous solution of SnCl4·5H2O as a precursor. XRD (X-ray diffraction), UV (ultraviolet visible spectroscopy), FESEM (field emission scanning electron microscopy), and EDS (energy dispersive spectroscopy) analysis are done for structural, optical, surface morphological, and compositional analysis. XRD analysis shows polycrystalline nature of samples with pure phase formation. Crystallite size calculated from diffraction peaks is 29.92 nm showing nanostructured thin films. FESEM analysis shows that SnO2 thin film contains voids with nanoparticles. EDS analysis confirms the composition of deposited thin film on glass substrate. UV-visible absorption spectra show that the bandgap of SnO2 thin film is 3.54 eV. Bandgap of SnO2 thin film can be tuned that it can be used in optical devices.