Development of Quantum Simulator for Emerging Nanoelectronics Devices
Figure 14
Typical - characteristics of spin FET simulated by the simulator NEMO-VN2 for various values of = 0.1 V, 0.2 V and 0.3 V at room temperature, = 300 K. The spin FET device parameters are material, GaAs, = 20 nm, and the gate thickness is 1 nm.