Table of Contents
ISRN Optics
Volume 2012, Article ID 801468, 8 pages
Research Article

Structural, Optical, and Luminescence Properties of Reactive Magnetron Sputtered Tungsten Oxide Thin Films

Department of Physics, Sri Venkateswara University, Tirupati 517 502, India

Received 30 September 2012; Accepted 5 November 2012

Academic Editors: E. Lidorikis, V. Matejec, and X. Shu

Copyright © 2012 V. Madhavi et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.


Tungsten oxide (WO3) thin films were deposited on to unheated Corning glass and silicon substrates by RF magnetron sputtering of metallic tungsten target at various oxygen partial pressures in the range  Pa. The influence of oxygen partial pressure on the structure and surface morphology and the optical and photoluminescence properties of the films were investigated. X-ray diffraction studies revealed that the deposited films were amorphous in nature. Fourier transform infrared transmission spectra confirmed that the presence of stretching vibration of W-O-W and deformation of W-O bonds related to the WO3. The optical transmittance of the films at wavelengths >500 nm increased from 62% to 85% with the increase of oxygen partial pressure. The optical band gap of the films increased from 3.00 to 3.14 eV and the refractive index of the films decreased from 2.26 to 2.08 with the increase of oxygen partial pressure from to  Pa, respectively. The photoluminescence studies indicated that the intense blue emission which was assigned to band-to-band transition was observed at oxygen partial pressure of  Pa.