Table of Contents
ISRN Condensed Matter Physics
Volume 2013, Article ID 527341, 9 pages
Research Article

Sputter Power Influenced Structural, Electrical, and Optical Behaviour of Nanocrystalline CuNiO2 Films Formed by RF Magnetron Sputtering

1Department of Physics, Sri Venkateswara University, Tirupati 517 502, Andhra Pradesh, India
2Department CP2S, Institut Jean Lamour (UMR CNRS 7198), Ecole des Mines, Nancy Universite, 54042 Nancy Cedex, France

Received 2 June 2013; Accepted 24 July 2013

Academic Editors: T. Jarlborg, Y. H. Matsuda, and Z. Sefrioui

Copyright © 2013 A. Sreedhar et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.


Copper nickel oxide (CuNiO2) films were deposited on glass and silicon substrates using RF magnetron sputtering of equimolar Cu50Ni50 alloy target at different sputter powers in the range of 3.1–6.1 W/cm2. The effect of sputter power on the chemical composition, crystallographic structure, chemical binding configuration, surface morphology, and electrical and optical properties of CuNiO2 films was investigated. The films formed at sputter power of 5.1 W/cm2 were of nearly stoichiometric CuNiO2. Fourier transform infrared spectroscopic studies indicated the presence of the characteristic vibrational bands of copper nickel oxide. The nanocrystalline CuNiO2 films were formed with the increase in grain size from 75 to 120 nm as the sputter power increased from 3.1 to 5.1 W/cm2. The stoichiometric CuNiO2 films formed at sputter power of 5.1 W/cm2 exhibited electrical resistivity of 27 Ωcm, Hall mobility of 21 cm2/Vsec, and optical bandgap of 1.93 eV.