Effects of Added Chloride Ion on Electrodeposition of Copper from a Simulated Acidic Sulfate Bath Containing Cobalt Ions

Figure 3

Anodic potentiodynamic curves in the presence of added chloride ion. Key: added [Cl⁻.aq]_o(1) nil; (2) 5 ppm; (3) 50 ppm; (4) 100 ppm (Cu²⁺ = 20 g/L, H₂SO₄ = 30 g/L, [Co²⁺]_o=150 ppm 𝑇=30±1°C, scan rate 20 mV/Sec).