Research Article

Characterization of Silver Oxide Films Formed by Reactive RF Sputtering at Different Substrate Temperatures

Table 1

Sputter deposition parameters fixed for the growth of silver oxide films.

Deposition methodRF magnetron sputtering
Sputter target Silver (50 mm dia. and 3 mm thick)
Target to substrate distance 65 mm
Base pressure  Pa
Oxygen partial pressure  Pa
Sputter pressure 4 Pa
Substrate temperature ( ) 303–473 K
Sputter power 65 W