Research Article
Characterization of Silver Oxide Films Formed by Reactive RF Sputtering at Different Substrate Temperatures
Table 1
Sputter deposition parameters fixed for the growth of silver oxide films.
| Deposition method | RF magnetron sputtering | Sputter target | Silver (50 mm dia. and 3 mm thick) | Target to substrate distance | 65 mm | Base pressure | Pa | Oxygen partial pressure | Pa | Sputter pressure | 4 Pa | Substrate temperature () | 303–473 K | Sputter power | 65 W |
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