Modeling and Simulation of  a Chemical  Vapor Deposition

<table class="table-group" id="tab2"><tr><td><table class="table"><tr><td class="thead-hr" colspan="2"><hr/></td></tr><tr class="thead"><td align="left"> Temperature (C)</td><td align="center"> Ratio (SiC : C)</td></tr><tr><td class="thead-hr" colspan="2"><hr/></td></tr><tr><td align="left"> 400</td><td align="center"> 2.4 : 1</td></tr><tr><td align="left"> 600</td><td align="center"> 1.5 : 1</td></tr><tr><td align="left"> 700</td><td align="center"> 1.211 : 1</td></tr><tr><td align="left"> 800</td><td align="center"> 1.1 : 1</td></tr><tr class="table-tr"><td colspan="2"><hr class="tbody-hr"/></td></tr></table></td></tr></table>

Journal of Applied Mathematics

tab2

Table 2

Table 2: Modeling and Simulation of  a Chemical  Vapor Deposition 