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E-Journal of Chemistry
Volume 2, Issue 3, Pages 171-177
http://dx.doi.org/10.1155/2005/879524

The Effect of Deposition Rate on Electrical, Optical and Structural Properties of ITO Thin Films

P. S. Raghupathi, Joseph George, and C. S. Menon

School of Pure and Applied Physics, Mahatma Gandhi University, Kottayam - 686560, Kerala, India

Received 22 April 2005; Accepted 31 May 2005

Copyright © 2005 Hindawi Publishing Corporation. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

P. S. Raghupathi, Joseph George, and C. S. Menon, “The Effect of Deposition Rate on Electrical, Optical and Structural Properties of ITO Thin Films,” E-Journal of Chemistry, vol. 2, no. 3, pp. 171-177, 2005. https://doi.org/10.1155/2005/879524.