A Novel Approach for Fabricating LaMnO<sub>3</sub> Thin Films Using Combined Microwave Combustion and Pulsed Electron Deposition Techniques

<div>XRD patterns of the LaMnO<sub>3</sub> thin films deposited before and after annealing at 400°C, 600°C, and 800°C with a discharging voltage of 15 kV.</div>

Journal of Chemistry

fig5

Figure 5

Figure 5: A Novel Approach for Fabricating LaMnO<sub>3</sub> Thin Films Using Combined Microwave Combustion and Pulsed Electron Deposition Techniques 

Journal of Chemistry

A Novel Approach for Fabricating LaMnO3 Thin Films Using Combined Microwave Combustion and Pulsed Electron Deposition Techniques

Figure 5

A Novel Approach for Fabricating LaMnO₃ Thin Films Using Combined Microwave Combustion and Pulsed Electron Deposition Techniques