Surface Modification and Alloying of Aluminum and Titanium Alloys with Low-Energy, High-Current Electron Beams

Figure 20

Nanohardness-depth profiles for Ti substrate (■) and Ti-Al surface alloys, fabricated at various processing conditions: (∇) 𝑁=5; (●) 𝑁=10; (□) 𝑁=15; (○) 𝑁=15 followed by vacuum annealing (700°C, 1 h); (▲) 𝑁=20; (Δ) 𝑁=40 followed by pulsed melting (3 μs, 4-5 J/cm², 𝑛=3,𝑇₀= 680°C); (▾) 𝑁=40 followed by pulsed melting (100 μs, 13 J/cm², 𝑛=9).