Journal of Materials / 2013 / Article / Tab 2

Research Article

Reactive Pulsed Laser Deposition of Titanium Nitride Thin Films: Effect of Reactive Gas Pressure on the Structure, Composition, and Properties

Table 2

Roughness of the films as measured from AFM.

Deposition pressure (Pa)RMS roughness (nm)

1.0 1.9
3.0 2.2
5.0 6.6
7.0 4.5
10.0 4.3

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