Abstract
This article analyzed and studied the concentration mechanism of metal impurities of ULSI multilayered wiring CMP in the special-purpose nanometer
Open Access
Control Effect of Nanometer SiO2 Hydrosol on Alloy Impurity in CMP Process of ULSI
Received26 Dec 2005
Accepted12 Nov 2006
Published24 Dec 2006
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Copyright
Copyright © 2006 Liu Yuling et al. This is an open access article distributed under the
Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.