Nanoporous and Nanostructured Materials for Catalysis, Sensor, and Gas Separation ApplicationsView this Special Issue
Jeffrey W. Elam, Guang Xiong, Catherine Y. Han, H. Hau Wang, James P. Birrell, Ulrich Welp, John N. Hryn, Michael J. Pellin, Theodore F. Baumann, John F. Poco, Joe H. Satcher, "Atomic Layer Deposition for the Conformal Coating of Nanoporous Materials", Journal of Nanomaterials, vol. 2006, Article ID 064501, 5 pages, 2006. https://doi.org/10.1155/JNM/2006/64501
Atomic Layer Deposition for the Conformal Coating of Nanoporous Materials
Atomic layer deposition () is ideal for applying precise and conformal coatings over nanoporous materials. We have recently used to coat two nanoporous solids: anodic aluminum oxide () and silica aerogels. possesses hexagonally ordered pores with diameters nm and pore length microns. The membranes were coated by to fabricate catalytic membranes that demonstrate remarkable selectivity in the oxidative dehydrogenation of cyclohexane. Additional membranes coated with Pd films show promise as hydrogen sensors. Silica aerogels have the lowest density and highest surface area of any solid material. Consequently, these materials serve as an excellent substrate to fabricate novel catalytic materials and gas sensors by .
- S. M. George, A. W. Ott, and J. W. Klaus, “Surface chemistry for atomic layer growth,” Journal of Physical Chemistry, vol. 100, no. 31, pp. 13121–13131, 1996.
- M. Ritala and M. Leskelä, “Atomic layer deposition,” in Handbook of Thin Films Materials, H. S. Nalwa, Ed., vol. 1, pp. 103–156, Academic Press, San Diego, Calif, USA, 2001, chapter 2.
- J. W. Elam, D. Routkevitch, P. P. Mardilovich, and S. M. George, “Conformal coating on ultrahigh-aspect-ratio nanopores of anodic alumina by atomic layer deposition,” Chemistry of Materials, vol. 15, no. 18, pp. 3507–3517, 2003.
- S. O. Kucheyev, J. Biener, Y. M. Wang et al., “Atomic layer deposition of ZnO on ultralow-density nanoporous silica aerogel monoliths,” Applied Physics Letters, vol. 86, no. 8, Article ID 083108, pp. 1–3, 2005.
- A. C. Dillon, A. W. Ott, J. D. Way, and S. M. George, “Surface chemistry of deposition using and in a binary reaction sequence,” Surface Science, vol. 322, no. 1–3, pp. 230–242, 1995.
- A. W. Ott, J. W. Klaus, J. M. Johnson, and S. M. George, “ thin film growth on Si(100) using binary reaction sequence chemistry,” Thin Solid Films, vol. 292, no. 1-2, pp. 135–144, 1997.
- M. Ritala, M. Leskelä, E. Nykänen, P. Soininen, and L. Niinistö, “Growth of titanium dioxide thin films by atomic layer epitaxy,” Thin Solid Films, vol. 225, no. 1-2, pp. 288–295, 1993.
- J. C. Badot, S. Ribes, E. B. Yousfi et al., “Atomic layer epitaxy of vanadium oxide thin films and electrochemical behavior in presence of lithium ions,” Electrochemical and Solid-State Letters, vol. 3, no. 10, pp. 485–488, 2000.
- E. B. Yousfi, J. Fouache, and D. Lincot, “Study of atomic layer epitaxy of zinc oxide by in-situ quartz crystal microgravimetry,” Applied Surface Science, vol. 153, no. 4, pp. 223–234, 2000.
- J. J. Senkevich, F. Tang, D. Rogers et al., “Substrate-independent palladium atomic layer deposition,” Chemical Vapor Deposition, vol. 9, no. 5, pp. 258–264, 2003.
- H. H. Wang, C. Y. Han, G. A. Willing, and Z. Xiao, “Nanowire and nanotube syntheses through self-assembled nanoporous AAO templates,” Materials Research Society Symposium Proceedings, vol. 775, pp. 107–112, 2003.
- L. Hrubesh, T. Tillotson, and J. F. Poco, Chemical Processing of Advanced Materials, John Wiley & Sons, New York, NY, USA, 1992.
- M. J. Pellin, P. C. Stair, G. Xiong et al., “Mesoporous catalytic membranes: synthetic control of pore size and wall composition,” Catalysis Letters, vol. 102, no. 3-4, pp. 127–130, 2005.
- J. W. Elam, M. D. Groner, and S. M. George, “Viscous flow reactor with quartz crystal microbalance for thin film growth by atomic layer deposition,” Review of Scientific Instruments, vol. 73, no. 8, pp. 2981–2987, 2002.
- G. Xiong, J. W. Elam, H. Feng et al., “Effect of atomic layer deposition coatings on the surface structure of anodic aluminum oxide membranes,” Journal of Physical Chemistry B, vol. 109, no. 29, pp. 14059–14063, 2005.
Copyright © 2006 Jeffrey W. Elam et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.