Atomic Layer Deposition for the Conformal Coating of Nanoporous Materials

Elam, Jeffrey W.; Xiong, Guang; Han, Catherine Y.; Wang, H. Hau; Birrell, James P.; Welp, Ulrich; Hryn, John N.; Pellin, Michael J.; Baumann, Theodore F.; Poco, John F.; Satcher, Joe H.

doi:https://doi.org/10.1155/JNM/2006/64501

Journal of Nanomaterials

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Nanoporous and Nanostructured Materials for Catalysis, Sensor, and Gas Separation Applications

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Volume 2006 | Article ID 064501 | https://doi.org/10.1155/JNM/2006/64501

Atomic Layer Deposition for the Conformal Coating of Nanoporous Materials

Jeffrey W. Elam,¹Guang Xiong,²Catherine Y. Han,²H. Hau Wang,²James P. Birrell,²Ulrich Welp,²John N. Hryn,¹Michael J. Pellin,²Theodore F. Baumann,³John F. Poco,³and Joe H. Satcher³

Received15 Mar 2006

Revised09 May 2006

Accepted10 May 2006

Published06 Jul 2006

Abstract

Atomic layer deposition (ALD) is ideal for applying precise and conformal coatings over nanoporous materials. We have recently used ALD to coat two nanoporous solids: anodic aluminum oxide (AAO) and silica aerogels. AAO possesses hexagonally ordered pores with diameters d∼40 nm and pore length L∼70 microns. The AAO membranes were coated by ALD to fabricate catalytic membranes that demonstrate remarkable selectivity in the oxidative dehydrogenation of cyclohexane. Additional AAO membranes coated with ALD Pd films show promise as hydrogen sensors. Silica aerogels have the lowest density and highest surface area of any solid material. Consequently, these materials serve as an excellent substrate to fabricate novel catalytic materials and gas sensors by ALD.

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Copyright

Copyright © 2006 Jeffrey W. Elam et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

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