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Journal of Nanomaterials
Volume 2008, Article ID 267161, 9 pages
http://dx.doi.org/10.1155/2008/267161
Research Article

Pressure and Temperature Effects on Stoichiometry and Microstructure of Nitrogen-Rich TiN Thin Films Synthesized via Reactive Magnetron DC-Sputtering

Department of Mechanical Engineering, Bourns College of Engineering, University of California, Riverside, CA 92521, USA

Received 1 September 2007; Accepted 11 January 2008

Academic Editor: Jun Lou

Copyright © 2008 E. Penilla and J. Wang. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

E. Penilla and J. Wang, “Pressure and Temperature Effects on Stoichiometry and Microstructure of Nitrogen-Rich TiN Thin Films Synthesized via Reactive Magnetron DC-Sputtering,” Journal of Nanomaterials, vol. 2008, Article ID 267161, 9 pages, 2008. https://doi.org/10.1155/2008/267161.