Research Article

Chromium-Induced Nanocrystallization of a-Si Thin Films into the Wurtzite Structure

Figure 1

Optical micrograph of (a) a-Si thin film on BSG substrates showing shallow saucer pits (S-pits). (b) Cr/a-Si/BSG after annealing at 500°C for 20 minutes. (c) 280 nm thick a-Si film with 30 nm of Cr overlayer annealed at 500°C for 20 minutes.
736534.fig.001a
(a)
736534.fig.001b
(b)
736534.fig.001c
(c)