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Journal of Nanomaterials
Volume 2010 (2010), Article ID 841659, 7 pages
http://dx.doi.org/10.1155/2010/841659
Research Article

Fabrication and Characterization of Hydrophilic TiO2 Thin Films on Unheated Substrates Prepared by Pulsed DC Reactive Magnetron Sputtering

1Photonic Technology Laboratory, National Electronics and Computer Technology Center, Pathumthani 12120, Thailand
2Department of Physics, Faculty of Science, Srinakharinwirot University, Bangkok 10110, Thailand
3Thailand Center of Excellence in Physics, CHE, 328 Si Ayutthaya Rd., Bangkok 10400, Thailand
4Department of Physics, Faculty of Science, King Mongkut’s University of Technology Thonburi, Bangkok 10140, Thailand

Received 1 May 2010; Accepted 15 July 2010

Academic Editor: Theodorian Borca-Tasciuc

Copyright © 2010 M. Horprathum et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

Abstract

T i O 2 thin films were deposited on unheated silicon wafers (100) and glass slides by a pulsed DC reactive magnetron sputtering in an ultrahigh vacuum (UHV) system. The effects of both an operating pressure and deposition time on film structure, surface morphology, and optical property were studied. The film structure and microstructure were characterized by grazing-incidence X-ray diffraction (GIXRD) technique and transmission electron microscopy (TEM). The surface morphology was investigated by field emission scanning electron microscopy (FE-SEM). The optical property of the T i O 2 thin films was determined by spectroscopic ellipsometry (SE). The water contact angle measurement was also used to determine hydrophilicity of the films after exposed to UV light. The results suggested that the T i O 2 thin film at less than 40 nm was amorphous. As the thickness was increased, the mixture of anatase and rutile phases of T i O 2 began to form. By reducing the operating pressure during the film deposition, the rutile phase component can also be enhanced. Both the increased film thickness and decrease operating pressure were the critical factors to improve the hydrophilicity of the T i O 2 thin films.